有公开服务证据
ASU NanoFab
ASU NanoFab at Arizona State University provides shared-facility access for nanofabrication and microfabrication, surface and thin-film characterization, and materials characterization. Registration, training, project review, fees, and current instrument availability may apply.
公开提供对外服务
公开描述的能力
Fabrication
Nanofabrication and microfabrication
Advanced characterization
Surface and thin-film characterization
Materials testing
Materials characterization
技术清单
技术与设备
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微纳加工
cleanroom metrology and packaging tools listed by ASU NanoFab
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微纳加工
photolithography and electron-beam lithography tools
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微纳加工
plasma etch and thin-film deposition tools
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实验室设备
Cambridge Savannah ALD deposits Al2O3, TiO2 and HfO2 films.
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微纳加工
Lesker #3/#4 four-pocket e-beam evaporators with 12-inch platens and Lesker #5 four-gun DC/RF sputter system support thin films.
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实验室设备
OAI Model 800/808 front/backside mask aligner provides approximately 1-2 micrometre alignment accuracy.
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实验室设备
Oxford PECVD deposits SiO2, Si3N4 and low-stress SiON with plasma-enhanced step coverage.
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微纳加工
PlasmaLab M80 Plus chlorine/fluorine RIE, PlasmaTherm Apex ICP, STS AGE ICP and STS ASE DRIE support compound-semiconductor, dielectric and Bosch silicon etching.
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实验室设备
SCS programmable spin coater applies photoresists, polyimides, silica films and other organic solutions.
登记范围证据
- ◇Access: Open to ASU, other institutions and industry; external companies may use staff foundry service or prototyping access..
- ◇Capabilities: Nanofabrication, silicon processing, molecular and bioelectronics, MEMS, nanofluidics, optoelectronics and device characterization..
- ◇Operations: Training and equipment scheduling are managed through iLab after onboarding..
- ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.
本条目依据的证据
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