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ASU NanoFab

ASU NanoFab at Arizona State University provides shared-facility access for nanofabrication and microfabrication, surface and thin-film characterization, and materials characterization. Registration, training, project review, fees, and current instrument availability may apply.

公开提供对外服务

3 项服务能力 9 条设备记录 核查于 2026年8月29日

公开描述的能力

Fabrication

Nanofabrication and microfabrication

Advanced characterization

Surface and thin-film characterization

Materials testing

Materials characterization

技术清单

技术与设备

2 类设备
  • 微纳加工

    cleanroom metrology and packaging tools listed by ASU NanoFab

  • 微纳加工

    photolithography and electron-beam lithography tools

  • 微纳加工

    plasma etch and thin-film deposition tools

  • 实验室设备

    Cambridge Savannah ALD deposits Al2O3, TiO2 and HfO2 films.

  • 微纳加工

    Lesker #3/#4 four-pocket e-beam evaporators with 12-inch platens and Lesker #5 four-gun DC/RF sputter system support thin films.

  • 实验室设备

    OAI Model 800/808 front/backside mask aligner provides approximately 1-2 micrometre alignment accuracy.

  • 实验室设备

    Oxford PECVD deposits SiO2, Si3N4 and low-stress SiON with plasma-enhanced step coverage.

  • 微纳加工

    PlasmaLab M80 Plus chlorine/fluorine RIE, PlasmaTherm Apex ICP, STS AGE ICP and STS ASE DRIE support compound-semiconductor, dielectric and Bosch silicon etching.

  • 实验室设备

    SCS programmable spin coater applies photoresists, polyimides, silica films and other organic solutions.

登记范围证据

  • ◇Access: Open to ASU, other institutions and industry; external companies may use staff foundry service or prototyping access..
  • ◇Capabilities: Nanofabrication, silicon processing, molecular and bioelectronics, MEMS, nanofluidics, optoelectronics and device characterization..
  • ◇Operations: Training and equipment scheduling are managed through iLab after onboarding..
  • ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.

本条目依据的证据

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