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有公开服务证据

Nanoscale Characterization and Fabrication Lab (NCFL)

Nanoscale Characterization and Fabrication Lab (NCFL) at Virginia Tech provides shared-facility access for x-ray and synchrotron characterization, electron microscopy, nanofabrication and microfabrication, and surface and thin-film characterization. Registration, training, project review, fees, and current instrument availability may apply.

公开提供对外服务

4 项服务能力 9 条设备记录 核查于 2026年8月29日

公开描述的能力

Advanced characterization

X-ray and synchrotron characterization

Advanced characterization

Electron microscopy

Fabrication

Nanofabrication and microfabrication

Advanced characterization

Surface and thin-film characterization

了解设备

仪器型号

2 个型号示意图

CAD 示意图展示的是仪器型号。实际安装配置和当前可用性需向实验室确认。

技术清单

技术与设备

3 类设备

  • 微纳加工

    cleanroom process equipment

  • 显微与成像

    electron microscope

  • 显微与成像

    focused-ion-beam system

  • 表面分析

    surface analysis instrument

  • 显微与成像

    Additional official inventory includes JEOL IT-500HR and JSM-IT800 FEG SEMs, FEI Quanta 600 ESEM, JEOL JBX-8100FS EBL, AFM, triboindenter and specimen-preparation systems.

  • 显微与成像

    JEOL JEM 2100 analytical S/TEM provides STEM-EDS mapping to about 5 nm and imaging suited to polymeric and biological samples.

  • 显微与成像

    JEOL JEM ARM200F NEOARM aberration-corrected S/TEM uses a cold FEG at 80/200 kV, reaches 0.07 nm STEM HAADF resolution at 200 kV and carries dual 100 mm2 EDS detectors.

  • 表面分析

    PHI Quantera Hybrid XPS uses monochromatic Al K-alpha with 9-200 micrometre selectable beam, automated ion-milling depth profiling and a stage heated to 300 C.

  • 显微与成像

    Thermo Scientific Helios 5 UC combines SEM and FIB, with 0.6 nm electron resolution, 2.5 nm ion resolution, 500 V-30 kV operation, EDS/EBSD and 3D reconstruction workflows.

登记范围证据

  • ◇Network membership: NCFL is identified as a NanoEarth/NNCI facility..
  • ◇Facility: Virginia Tech identifies NCFL as a shared nanoscale characterization and fabrication laboratory..
  • ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.

本条目依据的证据

Facility-owned shared-access information 核查于 2026年8月26日Facility-owned shared-access information 核查于 2026年8月26日Nanoscale Characterization and Fabrication Lab (NCFL) official instrument evidence 核查于 2026年8月29日Nanoscale Characterization and Fabrication Lab (NCFL) official instrument evidence 核查于 2026年8月29日Nanoscale Characterization and Fabrication Lab (NCFL) official instrument evidence 核查于 2026年8月29日Nanoscale Characterization and Fabrication Lab (NCFL) official instrument evidence 核查于 2026年8月29日Nanoscale Characterization and Fabrication Lab (NCFL) official instrument evidence 核查于 2026年8月29日

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