Singh Center for Nanotechnology Quattrone Nanofabrication Facility

• 微纳加工

  electron-beam and optical lithography systems

• 实验室设备

  packaging and metrology tools

• 实验室设备

  plasma and wet etching systems

• 微纳加工

  thin-film deposition systems

• 实验室设备

  Cambridge/Veeco Savannah S200 ALD coat substrates through 200 mm and ultra-high-aspect-ratio structures; Oxford PlasmaLab 100 PECVD deposits SiO2, Si3N4 and amorphous Si to 400 C.

• 微纳加工

  Heidelberg DWL66+ 405-nm laser writer patterns photomasks and 10 mm pieces through 6-inch wafers at 0.6-2 micrometre resolution depending on lens.

• 微纳加工

  IPG IX280-DXF and IX-255 laser systems support drilling, dicing, thin-film removal and micromachining in ceramics, metals, polymers, glass, PDMS and semiconductors.

• 实验室设备

  Nanonex NX-2600 supports thermal, photocurable and embossing nanoimprint with sub-5-nm imprint resolution and sub-micrometre alignment; Nanoscribe Photonic Professional GT provides two-photon 3D printing.

• 实验室设备

  Raith EBPG5200+ 100 kV EBL has a 125 MHz pattern generator, 350 nA maximum current and sub-8-nm linewidth with better-than-10-nm stitching/overlay.

登记范围证据

• ◇Facility role: Nanofabrication subfacility within the Singh Center.
• ◇Commercial terms: Published fee system includes external user categories and QNF area charges.
• ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.

本条目依据的证据