有公开服务证据
Stanford Nanofabrication Facility
Stanford Nanofabrication Facility at Stanford University provides shared-facility access for nanofabrication and microfabrication, and surface and thin-film characterization. Registration, training, project review, fees, and current instrument availability may apply.
公开提供对外服务
公开描述的能力
Fabrication
Nanofabrication and microfabrication
Advanced characterization
Surface and thin-film characterization
技术清单
技术与设备
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微纳加工
cleanroom process equipment
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微纳加工
electron-beam lithography system
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微纳加工
photolithography system
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实验室设备
semiconductor process equipment
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微纳加工
thin-film deposition system
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实验室设备
Aixtron Black Magic graphene CVD, Aixtron III-N/III-V MOCVD and AMAT Centurion epitaxy systems support graphene, compound-semiconductor and silicon-compatible growth workflows.
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微纳加工
Current inventory lists ASML PAS 5500/60 i-line stepper, Heidelberg MLA150 direct-write systems and Karl Suss MA-6 contact aligners for lithography.
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微纳加工
Fiji 1/2/3 ALD and MVD systems provide plasma-enhanced and thermal atomic-layer deposition with tool-specific material/cleanliness restrictions.
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微纳加工
KLA Rapier deep-reactive-ion etcher, Lam TCP 9400 poly etcher, MRC RIE and Plasma-Therm Versaline etch/CVD systems support silicon, dielectric and metal processing.
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显微与成像
Nanoscribe Photonics GT supports two-photon 3D patterning; Asylum/NanoCue AFM, Keyence VHX-6000, profilometers and electrical test stations provide metrology.
登记范围证据
- ◇External access: nano@stanford provides a dedicated external-user pathway for academic, government, nonprofit and industry users..
- ◇Capabilities: SNF supports deposition, patterning and etching of thin-film metals, dielectrics and semiconductors..
- ◇Address: Official visit page gives the Allen Building delivery address and room..
- ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.
本条目依据的证据
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