Singh Center for Nanotechnology Nanoscale Characterization Facility

• Microscopy & imaging

  JEOL F200 transmission electron microscope

• Microscopy & imaging

  JEOL NEOARM aberration-corrected scanning transmission electron microscope

• Microscopy & imaging

  scanning electron microscopy and focused-ion-beam systems listed by NCF

• Microscopy & imaging

  JEOL F200 200-kV cold-FEG S/TEM has dual EDS, Gatan OneView IS for 30-frame/s in-situ/operando imaging and STEMx capability.

• Microscopy & imaging

  JEOL NEOARM aberration-corrected S/TEM reaches installed resolution below 0.63 angstrom at 200 kV and includes dual EDS, DualEELS/Gatan Image Filter and K2-IS direct detection.

• Microscopy & imaging

  SEM suite includes JEOL 7500F HRSEM with 0.8 nm resolution at 30 kV and FEI Quanta 600 FEG ESEM with EDS/EBSD, variable gas, 20-1000 C stages and in-situ manipulation.

• Surface analysis

  TESCAN S8000X combines Xe-plasma FIB, BrightBeam SEM, ToF-SIMS, EDS and cryogenic stage/loadlock to -160 C for milling, chemical analysis and cryo-lift-out.

• Laboratory equipment

  Thermo Fisher Krios cryo-EM includes an autoloader, Gatan BioQuantum EELS and K2 Summit detector with cryo-plunge, high-pressure-freezing and cryo-ultramicrotomy support.

• Micro/nanofabrication

  Zeiss ORION NanoFab uses He/Ne ion beams for approximately 0.5-nm-probe imaging and direct writing, with sub-5-nm He patterns and 10-100-nm Ne lithography.

Registry scope evidence

• ◇Facility role: Characterization subfacility within the Singh Center.
• ◇External access: Singh Center fee system includes external academic, corporate and government users.
• ◇Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.

Evidence used for this listing