← All labs

Public service evidence

Stanford Nanofabrication Facility

Stanford Nanofabrication Facility at Stanford University provides shared-facility access for nanofabrication and microfabrication, and surface and thin-film characterization. Registration, training, project review, fees, and current instrument availability may apply.

External services publicly offered

2 capabilities 10 equipment records Reviewed 2026-08-29

Publicly described capabilities

Fabrication

Nanofabrication and microfabrication

Advanced characterization

Surface and thin-film characterization

Technical inventory

Techniques and equipment

3 equipment types
  • Micro/nanofabrication

    cleanroom process equipment

  • Micro/nanofabrication

    electron-beam lithography system

  • Micro/nanofabrication

    photolithography system

  • Laboratory equipment

    semiconductor process equipment

  • Micro/nanofabrication

    thin-film deposition system

  • Laboratory equipment

    Aixtron Black Magic graphene CVD, Aixtron III-N/III-V MOCVD and AMAT Centurion epitaxy systems support graphene, compound-semiconductor and silicon-compatible growth workflows.

  • Micro/nanofabrication

    Current inventory lists ASML PAS 5500/60 i-line stepper, Heidelberg MLA150 direct-write systems and Karl Suss MA-6 contact aligners for lithography.

  • Micro/nanofabrication

    Fiji 1/2/3 ALD and MVD systems provide plasma-enhanced and thermal atomic-layer deposition with tool-specific material/cleanliness restrictions.

  • Micro/nanofabrication

    KLA Rapier deep-reactive-ion etcher, Lam TCP 9400 poly etcher, MRC RIE and Plasma-Therm Versaline etch/CVD systems support silicon, dielectric and metal processing.

  • Microscopy & imaging

    Nanoscribe Photonics GT supports two-photon 3D patterning; Asylum/NanoCue AFM, Keyence VHX-6000, profilometers and electrical test stations provide metrology.

Registry scope evidence

  • External access: nano@stanford provides a dedicated external-user pathway for academic, government, nonprofit and industry users..
  • Capabilities: SNF supports deposition, patterning and etching of thin-film metals, dielectrics and semiconductors..
  • Address: Official visit page gives the Allen Building delivery address and room..
  • Official-source, facility-specific instrument evidence is available. Current configuration, availability, price, and project fit require confirmation.

Evidence used for this listing

Vicena compiles these public listings from cited laboratory sources. A listing does not imply a partnership, current availability, pricing, or acceptance of a project. This profile is not an endorsement, availability check, quote, or representation of a commercial relationship.